What is Magnetron Spraying?

Magnetron Spartering is a type of physical deposition, a process in which the target material is evaporated and stored on the substrate to create a thin film. Because magnets use magnets to stabilize the charge, the spray magnetron can be carried out at lower pressures. In addition, this spraying process can create accurate and evenly distributed thin movies and allows more diversity in the target material. Magnetronparting is often used to create thin metal films on various materials such as plastic bags, compact disks (CD) and digital video disks (DVDs), and are usually used in semiconductor industry. Argon, or other inert gas, is slowly fed, allowing the chamber to maintain low pressure. Furthermore, the current is introduced through the power supply of the machine and brings electrons to the chamber that begins to bomb the atoms of Argon and the religion of the electron in their external electron shells. As a result, Argon's atoms form positively charged cations that begin to bomb the targetMaterial and release its small spray molecules that are collected on the substrate.

While this method is generally effective for creating thin films, free electrons in the chamber not only bombard Argon atoms, but also the surface of the target material. This can lead to a large extent of damage to the target material, including the uneven surface structure and overheating. In addition, traditional diode spraying can complete for a long time and open even more opportunities to damage the electrons of the target material.

MAGNETRON SAIPRING offers a higher degree of ionization and less damage to the target material than traditional deposition techniques. In this process, the acidic energy is introduced to the magnet for stabilizing free electrons, protecting the target material from contact with the electron and also to increase the likelihood that electrons ionize Argon atoms. Magnet creates a field that keeps electrons limited and fromAcaded above the target material where they cannot hurt him. Because the magnetic field lines are curved, the electron path in the chamber extends through the argon stream, improves the ionization rate and shortens the time until the thin film is completed. In this way, Magnetron spraying is able to counteract the initial problems of time and damage the target material that occurred in the traditional spraying of the diode.